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2001, 05, 364-368
Chemical Vapor Deposition and Preparation of Materials
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DOI: 10.13373/j.cnki.cjrm.2001.05.011
Abstract:

The general rule and technology of chemical vapor deposition(CVD) were introduced first. The development and application of CVD technology in preparation of materials were reviewed, especially in the preparation of films and coatings of precious metals.

KeyWords:
References

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Basic Information:

DOI:10.13373/j.cnki.cjrm.2001.05.011

China Classification Code:TG174.44

Citation Information:

[1]Hu Changyi and Li Jinghua (Kunming Institute of Precious Metals,Kunming 650221,China).Chemical Vapor Deposition and Preparation of Materials[J].Chinese Journal of Rare Metals,2001(05):364-368.DOI:10.13373/j.cnki.cjrm.2001.05.011.

Fund Information:

云南省应用基础研究基金资助项目 ( 2 0 0 0E0 0 85M)

Published:  

2001-09-10

Publication Date:  

2001-09-10

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